Atomic Layer Deposition
Veeco is the leading ALD supplier to academic institutions and industrial customers worldwide, with over 530 ALD systems shipped for R&D and production.
The Savannah® Thermal and Fiji® Plasma systems are the ALD platforms of choice for R&D and have been cited in more than 2,000 peer-reviewed academic papers.
For fully automated industrial solutions for high-volume manufacturing (HVM) ALD combine lowest cost-of-ownership, superior throughput, and the highest standards of quality, the new Firebird™ HVM and proven Phoenix® platform is tailored to meet specific customer needs in terms of ALD process performance, wafer handling and throughput as well as flexible thermal management.
Fiji® series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases. The result is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.
The Firebird™ system is a fully automated batch production ALD platform delivering superb uniformity with best-in-class throughput at the lowest possible cost-per-wafer. Integrating proven Veeco automation solutions, it enables safe wafer handling via low-impact batch transfer.
The Phoenix® system is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to industrial-grade manufacturing. Technologists and researchers rely on the Phoenix® for repeatable, highly accurate film deposition on flat and 3D substrates alike.